Intel passes 1 million wafers processed with High-NA EUV tools

Intel says it has processed more than one million wafers using High-NA EUV (extreme ultraviolet) lithography tools, surpassing the combined output of the rest of the semiconductor industry. The company is also developing larger 6x12 photomasks aimed at speeding production and lowering costs.

Why it matters: High-NA EUV is the next-generation lithography needed to keep shrinking transistors for future AI accelerators and CPUs, and Intel's early lead here is central to its bet on regaining process-technology leadership over TSMC and Samsung. If Intel can turn this head start into reliable high-volume manufacturing, it strengthens the case for its foundry business as an alternative AI chip supplier.