Samsung delays 1.4nm chip node to 2029, plans High-NA EUV for 2030

Samsung Foundry has pushed its 1.4nm-class process node back to 2029, extending the life of its current SF2 node well beyond typical cycles. The company plans to bring in High-NA EUV lithography around 2030 to enable 1nm-class and smaller chips.

Why it matters: Slower node progress at Samsung, one of the few foundries capable of leading-edge chip production, narrows the field competing with TSMC for next-generation AI accelerator manufacturing. That could affect pricing and availability of advanced AI chips later this decade.